• exposure of standard glass substrates:
  4"x4", 5"x5", thickness: 1 to 3mm
• exposure of ceramic sustrates
• other dimensions and materials to order
• image scale: 1:5
• usable mask format: 5"x5"
• resolution capacity / image field size:
  

  numeric aperture	ø 0,25	ø 0,29	ø 0,35
  resolution capacity (µm)	1,4	1,2	1,0
  image field size (mm2)	20x20	16x16	12x12

  
  
• production of graduated plates in the above dimensions using the lift-off process or etched graduations
• coatings:
  chromium (chromium coatings using Diadur 1/2/3/4), silver, aluminium
• units:
  GCA 8000 - Wafer Stepper Exposure Systems,
  AÜR 2 - automatic cover repeater (modified - Jenoptik GmbH)

Projection and contact copy

• production of graduated plates, arcs and other graduated optics
• dimensions up to 200 x 200 mm
• resolution: approx. 3µm
• units: Suess Maskaligner, JUB 80 (Carl Zeiss Jena), JUB 2104 (Elektromat Dresden)